Global High-k and CVD ALD Metal Precursor Market Research Report 2024(Status and Outlook)
The Global High-k and CVD ALD Metal Precursor Market Size was estimated at USD 568.89 million in 2023 and is projected to reach USD 825.43 million by 2029, exhibiting a CAGR of 6.40% during the forecast period. Report Overview: Download FREE Sample of this Report @ https://www.24chemicalresearch.com/download-sample/257422/global-highk-cvd-ald-metal-precursor-market-2024-545 Precursors are the main raw materials for semiconductor thin film deposition processes, and are mainly used in vapor deposition (including PVD, CVD, and ALD) to form various thin film layers that meet the requirements of semiconductor manufacturing.Precursors can be divided into high-k precursors, low-k precursors, silicon oxide and silicon nitride precursors, metal and metal nitride precursors, etc. High dielectric constant precursor (High-k): Mainly used in 45nm and below semiconductor manufacturing process, used in CVD and ALD deposition technology of memory and logic chips to form capacitive dielectr...